ELECTRON TRAPS INVESTIGATION IN ION IMPLANTED MESFETS
Abstract
Capacitance and conductance Deep-Level Transient Spectroscopy has been performed in n - ion implanted MESFET channel layers prepared on semi-insulating Cr-doped LEC GaAs substrates together with the investigation of their electrical properties. Experi- mental results achieved by both methods have been compared and used for deep-level identification. Six significant electron traps have been detected. Important defect and re- combination parameters such as density profiles and energy level of electron traps, thermal emission rates and capture cross section were deduced from these measurements.
Keywords:
deep-levels, deep-level transient spectroscopy, ion implantation, GaAs, MESFETHow to Cite
Mazdra, P. “ELECTRON TRAPS INVESTIGATION IN ION IMPLANTED MESFETS”, Periodica Polytechnica Electrical Engineering, 34(1), pp. 35–45, 1990.
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